Pinhole density expresses the number of holes per unit area created in the resist due to contaminants or inherent properties. Standing waves reducing additives, proceedings of spie 10. Diazonaphthoquinone 289 words case mismatch in snippet view article find links to article ralph dammel 1993. In this way, dnq has become an important reagent in photoresist technology in the semiconductor industry. Raw dissolution rate data is highly reliable for detecting standing waves.
Reliable information about the coronavirus covid19 is available from the world health organization current situation, international travel. Download diazonaphthoquinone based resists or read online books in pdf, epub, tuebl, and mobi format. Please read our short guide how to send a book to kindle. Diazonaphthoquinone sulfonic acid esters are components of common photoresist materials. Dnq stands for diazonaphthoquinone, a lightsensitive compound that in its unexposed form interacts with a cresolformaldehyde resin, the novolak, to make a product that is insoluble in aqueous alkaline developer solution. Numerous and frequentlyupdated resource results are available from this search. Spie 10146, advances in patterning materials and processes xxxiv, 1014601 19 april 2017. Improved resolution of thick film resist effect of prebake. Download fullsize image films of novolak dissolve quite rapidly in aqueous alkali, but if they contain small concentrations of a diazonaphthoquinone dnq derivative, such as the dnq5sulfonic acid ester below, the rate of dissolution. Dammel, diazonaphthoquinonebased resists, spie press, 1993, p. The basic structure of dnq is shown in figure 8, along with the resonance structures that are commonly written for this compound. These chem ically amplified photoresists generally consi st of a base polymer, a photosensitive compound cal led.
Such additives allow the photo active compounds pacs to diffuse at reduced temperatures. Diazonaphthoquinonebased resists tutorial texts in optical. Although, as the title implies, the emphasis is upon the neuroscience of motivation, every attempt has been made to link this to the psychology of motivation. Buy now see all 3 formats and editions hide other formats and editions. Pinhole density expresses the number of holes per unit area created in the resist due to. Diazonaphthoquinone derivatives used in photoresists. Some resists also contain a dye, increasing the opacity of the base resin in order to reduce swing curve and notching effects. Diazonaphthoquinonebased resists spie digital library.
The exposed regions of the photoresist film become soluble in aqueous base. Diazonaphthoquinone5sulfonate composition variants. Click download or read online button to get diazonaphthoquinone based resists book now. Because of the push in recent years toward graphic arts materials that are not only durable but also environmentally friendly and nontoxic, testing has become even more important. Diazonaphthoquinone based resists download ebook pdf, epub. Uv was rather easily achieved by modifying diazonaphthoquinonenovolac resists. Many new resist systems based on a variety of acid. They are related to bakelite, which is more highly crosslinked. The performance of novolacdiazonaphthoquinonebased positiveworking resists is discussed in terms of the molecular weight distributions and microstructures. Focus also is placed on the chemical basis of applicationrelated facets of the lithographic process. Novolak resists have accompanied the evolution of the semiconductor industry almost from its beginning.
In spite of this, until quite recently, not even an outline of the functional mechanism of novolak resists was known. Novolak is a phenolformaldehyde condensation polymer of moderate molecular weight. Pdf download diazonaphthoquinone based resists free. This has a significant effect on standing waves reduction. Conventional, positiveacting photoresists such as those typified by most commercially available diazonaphthoquinone dnqbased photoresists are normally composed of a base resin and photoactive compound pac. Small molecules added to novolak diazonaphthoquinone based resists plasticize their dry film coatings. Advances in the design of organic resist materials.
Segment of novolak, illustrating the predominance of cresol subunits and presence of crosslinking. Information and translations of diazonaphthoquinone in the most comprehensive dictionary definitions resource on the web. Diazonaphthoquinone based resists tutorial text series volume 11 of tutorial texts in optical engineering. The enhanced mack model 8 yields a superset of the original mack model curve family. The basic chemistry of both dnq sensitizers and novolak resins are explored. The condensation of 2,3,4trihydroxybenzophenone with diazonaphthoquinone sulfonyl chloride in dimethylacetamide or nmethyl2pyrrolidone resulted in a diester isomer distribution that was different than that observed in acetone, 1,4dioxane, methyl ethyl. Electron beam exposure of diazoquinone based resists. This book elucidates the reasons underlying the lasting success of dnqn resist systems by examining the correlation between the chemical structure of the. Oclcs webjunction has pulled together information and resources to assist library staff as they consider how to handle coronavirus. The condensation of 2,3,4trihydroxybenzophenone with diazonaphthoquinone sulfonyl chloride in dimethylacetamide or nmethyl2pyrrolidone resulted in a diester isomer distribution that was different than that observed in acetone, 1,4dioxane, methyl ethyl ketone, tetrahydrofuran and gammabutyrolactone. This is often effective, but is not as good as vapor priming. Molecular modeling of the thermal decomposition of polymers. Resist patterning for subquartermicrometer device fabrications chiong, kaolin g.
The lithography capability and subsequent device processing control must be understood by the device designers and the. Liquid priming is the process of spinning hmds, diluted in solvent, onto a dehydrated wafer. Definition of diazonaphthoquinone in the dictionary. The goal of the lithography process is to provide a technique for patterning the various thinfilm materials used in mems and nems substrate fabrication.
Novolakdiazonaphthoquinone resists are the principal pattern transfer materials of the semiconductor industry, essential tools in building the devices that are making computers possible. Mar 19, 2019 chemistry a diazo derivative of naphthoquinone. There is information of nmethyl2pyrroridone in the material safety data sheet of supplier. Topics covered include the interaction of light with matter, spectrometer fundamentals, quantum mechanics, selection rules, and experimental factors. Performing organization name and address sra international, inc. Novolakdiazonaphthoquinone dnq resists are photosensitive varnishes that are used in the fabrication of more than 80% of todays integrated circuits. When exposed, diazonaphthoquinone dnq novolakbased thickfilm positive resist hereafter thickfilm resist decomposes into indene ketene, producing. This site is like a library, use search box in the widget to get ebook that you want. From the derivation, ii is expected to be equal to the number of dnq moieties in the pac.
Spectroscopythe study of matter using electromagnetic radiationand its applications as a scientific tool are the focus of this tutorial. The pac used in conventional positive photoresists is a diazonaphthoquinone dnq, an. Diazonaphthoquinone based resists tutorial texts in optical engineering. The lithography capability and subsequent device processing control must be understood by the device. Resist patterning for subquartermicrometer device fabrications. Diazonaphthoquinone is listed in the worlds largest and most authoritative dictionary database of abbreviations and acronyms. Home ebooks diazonaphthoquinone based resists stepbystep view of the lithographic process translator disclaimer you have requested a machine translation of selected content from our databases. Diazonaphthoquinone based resists download ebook pdf. The term comes from swedish lak for lacquer and latin novo for new, since. General mechanistic pathway for positive working, diazonaphthoquinone photoresists. This book elucidates the reasons underlying the lasting success of dnqn resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. Dammel had been with az electronic materials and its predecessors since 1986 in various technology functions.
Diazonaphthoquinone what does diazonaphthoquinone stand for. The effect of the additives on standing waves reduction is a direct. Mack, finle technologies, austin, texas there are a large number of materials, both organic and inorganic, which are sensitive to light see, for example, ref. Dammel, diazonaphthoquinone based resists, spie press, 1993, p. Novolak by itself is moderately soluble in the aqueous base developer. The molecular mechanism of novolakdiazonaphthoquinone resists. Diazonaphthoquinonebased resists by ralph dammel, 9780819410191, available at book depository with free delivery worldwide. The basics of spectroscopy spie tutorial texts in optical. When exposed, diazonaphthoquinone dnq novolak based thickfilm positive resist hereafter thickfilm resist decomposes into indene ketene, producing.
Pdf resist rehydration during thick film processing researchgate. You can read online diazonaphthoquinone based resists here in pdf, epub, mobi or docx formats. Diazonaphthoquinone based resists by ralph dammel, 9780819410191, available at book depository with free delivery worldwide. Photoresist key properties continued shelflife refers to the storage time of the resist before unacceptable changes of its properties occur. Diazonaphthoquinone what does diazonaphthoquinone stand. Society of photooptical instrumentation engineers, this book elucidates the reasons underlying the lasting success of dnqn resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. Pregnant rats were exposed to nmethyl2pyrroridone at atmospheric concentration of 0. This book elucidates the reasons underlying the lasting success of dnqn resist. Dammel from merck kgaa, darmstadt, germany, receives. Standing waves reducing additives, proceedings of spie. Improved resolution of thick film resist effect of pre. Whether youve loved the book or not, if you give your honest and detailed thoughts then people will find new books that are right for them. They are currently involved in the fabrication of more than 80% of the worlds integrated circuits. Resist patterning for subquartermicrometer device fabrications resist patterning for subquartermicrometer device fabrications chiong, kaolin g.
Dammel, diazonaphthoquinonebased resists, spie tutorial texts series no. The most common class of dissolution inhibitors used in nonchemically amplified novolac based resists belong the to the diazonaphthoquinone dnq family of compounds. His wellknown book diazonaphthoquinonebased resists is used as the definitive textbook on this topic. Highperformance liquid chromatographic method of photoactive compounds based on diazonaphthoquinone for positive photoresists byounghyounkim1, yon heekim1 and dong cheulmoon2 1analytical science, lg chem research park, lg chem ltd. For example, hanabata and coworkers 610 have used fractionation to optimize the performance of highresolution resists based on diazonaphthoquinone dnq pacs. However, over the years one specific class of photosensitive materials has been. In the unexposed regions of the resist film, the dnq acts as a dissolution inhibitor and. Hg lamp in the deep uv region was so small that a dramatic increase in resist sensitivity was required for economically feasible wafer throughputs. In our study we measure the dissolution rates of the exposed resist as a. Analysis of sampled imaging systems driggers, ronald g. Diazonaphthoquinone dnq is a diazo derivative of naphthoquinone. Upon exposure to light, dnq converts to a derivative that is susceptible to etching. Other readers will always be interested in your opinion of the books youve read.
Electron beam exposure of diazoquinone based resists wolfgang a. Highperformance liquid chromatographic method of photoactive. Diazonaphthoquinonebased resists tutorial texts in. Most commonly used is maskbased lithography, applying uv light for printing a pattern in a photoresist. Standing waves reducing additives standing waves reducing additives toukhy, medhat a.
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